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Results 1 to 25 of 14914

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Electroless copper deposition on aluminum-seeded ABS plasticsDAPENG LI; GOODWIN, Kate; YANG, Chen-Lu et al.Journal of materials science. 2008, Vol 43, Num 22, pp 7121-7131, issn 0022-2461, 11 p.Article

UHV chemical vapour deposition of silicon nanowiresSCHMIDT, Volker; SENZ, Stephan; GÖSELE, Ulrich et al.Zeitschrift für Metallkunde. 2005, Vol 96, Num 5, pp 427-428, issn 0044-3093, 2 p.Conference Paper

A simple geometric method for the thermodynamics of metastable chemical vapor deposition = Une méthode géométrique simple pour la thermodynamique du dépôt chimique en phase vapeurHACKNEY, S. A.Scripta metallurgica. 1988, Vol 22, Num 4, pp 469-474, issn 0036-9748Article

Nb2O5 coating of glass fibres applied by chemical vapour depositionDA SILVEIRA, C. B; DE OLIVEIRA, A. F; DE CAMPOS, S. D et al.Surface engineering. 2012, Vol 28, Num 1, pp 68-72, issn 0267-0844, 5 p.Article

Growth and Characterization of GaN Nanowires by NiCl2 Assisted Chemical Vapor DepositionXIAOFENG WEI; FENG SHI.Metallurgical and materials transactions. A, Physical metallurgy and materials science. 2011, Vol 42, Num 12, pp 3838-3843, issn 1073-5623, 6 p.Article

Pulsed biased growth of hanocrystalline diamond by hot filament chemical vapour depositionJONES, A. N; AHMED, W; HASSAN, I. U et al.Surface engineering. 2004, Vol 20, Num 3, pp 181-185, issn 0267-0844, 5 p.Conference Paper

Particle Dynamics in a Chemical Vapor Deposition Reactor: A Multiscale ApproachSHARIFI, Yousef; ACHENIE, Luke.Industrial & engineering chemistry research. 2009, Vol 48, Num 13, pp 5969-5974, issn 0888-5885, 6 p.Article

Characterization and Evaluation of Nanoparticle Release during the Synthesis of Single-Walled and Multiwalled Carbon Nanotubes by Chemical Vapor DepositionTSAI, Su-Jung; HOFMANN, Mario; HALLOCK, Marilyn et al.Environmental science & technology. 2009, Vol 43, Num 15, pp 6017-6023, issn 0013-936X, 7 p.Article

The formulation of electroless nickel-phosphorus plating baths = Formulation de bains de dépôt chimique de nickel-phosphorePARKER, K.Plating and surface finishing. 1987, Vol 74, Num 2, pp 60-65, issn 0360-3164Article

Growth and characterization of electroless deposited Cu films on carbon nanofibersCORDOBA, J. M; ODEN, M.Surface & coatings technology. 2009, Vol 203, Num 22, pp 3459-3464, issn 0257-8972, 6 p.Article

Le cuivrage chimique = Copper electroless coatingDEMANDRES, G.Surfaces (Paris). 1987, Vol 26, Num 187, pp 165-169, issn 0585-9840, 3 p.Article

Reflection characteristics of electroless deposited Sn-3.5Ag for LED lead framesSE HO KEE; WON JOONG KIM; JAE PIL JUNG et al.Surface & coatings technology. 2013, Vol 235, pp 778-783, issn 0257-8972, 6 p.Article

Effect of Reaction Temperature and Catalyst Type on the Formation of Boron Nitride Nanotubes by Chemical Vapor Deposition and Measurement of Their Hydrogen Storage CapacityBURCU SANER OKAN; ZÜLEYHA ÖZLEM KOCABAS; ASLI NALBANT ERGÜN et al.Industrial & engineering chemistry research. 2012, Vol 51, Num 35, pp 11341-11347, issn 0888-5885, 7 p.Article

A study of field drain ochre deposits. I: Abiotic chemical precipitationAP DEWI, I; KELSO, W. I; JOHNSON, D. B et al.Journal of Agricultural Science. 1987, Vol 108, Num 2, pp 341-345, issn 0021-8596Article

Molecular hydrogen in electroless copper deposits = L'hydrogène moléculaire dans les dépôts chimiques de cuivreGRAEBNER, J. E; OKINAKA, Y.Journal of applied physics. 1986, Vol 60, Num 1, pp 36-39, issn 0021-8979Article

Characterization of p-type CuAlO2 thin films grown by chemical solution depositionCHIU, S. H; HUANG, J. C. A.Surface & coatings technology. 2013, Vol 231, pp 239-242, issn 0257-8972, 4 p.Conference Paper

Mechanisms of surface selectivity in aluminum chemical vapor depositionHIGASHI, G. S; KRISHNAN RAGHAVACHARI; STEIGERWALD, M. L et al.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1990, Vol 8, Num 1, pp 103-105, issn 0734-211X, 3 p.Article

Cinétique de l'oxydation à l'air de graphite de pyrolyse de faible densitéLAVRENKO, V. A; NESHPOR, V. S; POMYTKIN, A. P et al.Himiâ tverdogo topliva. 1987, Num 4, pp 139-144, issn 0023-1177Article

Comportement en frottement des revêtements de nickel chimique = Friction behaviour of nickel electroless coatingsLE QUANG, G.Le Vide, les couches minces. 1986, Num 232, pp 63-65, issn 0223-4335Conference Paper

Controllable growth of 1―7 layers of graphene by chemical vapour depositionZHIQIANG TU; ZHUCHEN LIU; RICHARD, Pierre et al.Carbon (New York, NY). 2014, Vol 73, pp 252-258, issn 0008-6223, 7 p.Article

A review of carbon nanotube synthesis via fluidized-bed chemical vapor depositionCHEE HOWE SEE; HARRIS, Andrew T.Industrial & engineering chemistry research. 2007, Vol 46, Num 4, pp 997-1012, issn 0888-5885, 16 p.Article

Hydro-fluorinated amorphous silicon made by thermal CVD (chemical vapor deposition) methodMATSUMURA, H; IHARA, H; TACHIBANA, H et al.IEEE photovoltaic specialists conference. 18. 1985, pp 1277-1282Conference Paper

Optimization of a Chemical Vapor Deposition Process Using Sequential Experimental DesignWISSMANN, Paul J; GROVER, Martha A.Industrial & engineering chemistry research. 2010, Vol 49, Num 12, pp 5694-5701, issn 0888-5885, 8 p.Article

Controlled pore opening of Ni/Al2O3 using chemical vapor deposition in a fluidized bed reactorBOATENG, Kenneth A; LINJIE HU; HILL, Josephine M et al.Industrial & engineering chemistry research. 2007, Vol 46, Num 3, pp 684-690, issn 0888-5885, 7 p.Article

Effective synthesis of single-walled carbon nanotubes using Ni-MCM-41 catalytic template through chemical vapor deposition methodSOMANATHAN, Thirunavukkarasu; PANDURANGAN, Arumugam.Industrial & engineering chemistry research. 2006, Vol 45, Num 26, pp 8926-8931, issn 0888-5885, 6 p.Article

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